Az Developer 1 1 Msds. AZ® ECI 3012 is a DNQ based thin positive resist with very hig

AZ® ECI 3012 is a DNQ based thin positive resist with very high resolution potential for wet and dry etching applications. AZ® 3300 series positive photoresists are designed to meet the industry’s need for high performance g- and i-line crossover capabilities. The developer is corrosive and can cause eye and Mar 7, 2023 · KNI Developers These developers can be used on the Develop Bench in the Optical Lithography room or on the BASE Bench in the Wet Chemistry room: AZ 726 MIF: 2. An alternative sodium-based developer, AZ Developer, has a very low etch rate on aluminum and can also be used with AZ P4000 photoresist. Section 01 - Product Information Identification of the company: AZ Electronic Materials USA Corp. AZ® 400K Developer 1:4 is a buffered, KOH based developer formulation for many positive and image reversal resists. Pages in category "MSDS" This category contains only the following page. 38% TMAH-based, pre-diluted (ready-to-use) and slightly further diluted only when the application requires it. Description AZ 351B Developer is a general purpose developer for use with almost any positive AZ Photoresist. TARCs may also reduce pattern defect density by improving developer wettability. They exhibit excellent depth of focus, linearity, and photospeed for all crossover applications. Feb 13, 2006 · SDS management, distribution & revision solutions - for every budget. PRODUCT AND COMPANY IDENTIFICATION Product name Product Use Description Company : AZ 400K DEVELOPER : Intermediate for electronic industry : AZ Electronic Materials USA Corp. Developer Compatibility: Bold font indicates most compatible developer, resulting in shorter develop times and lower exposure energies. Data for AZ 300 MIF DEVELOPER Additional ecological information : No ecological testing was carried out on the preparation. The AZ Developer is available as a concentrate for custom diluting with DI water or pre-diluted 1:1 for use directly from the bottle. Product name : AZ 340 Developer Product Use Description : Intermediate for electronic industry Company : EMD Performance Materials Corp. The information MATERIAL SAFETY DATA SHEET AZ® Developer 1:1 Substance key: BBG7027 Version 1 REVISION DATE: 12/18/2009 Print Date: 01/06/2010 Feb 13, 2006 · SDS management, distribution & revision solutions - for every budget. 6 - 24µ Product Data Sheet: PDS MSDS: MSDS Developer: 1:4 AZ 400K:H2O Process: 9µm MANUFACTURER/SUPPLIER NAME: CLARIANT CORPORATION AZ ELECTRONIC MATERIALS P. 3 Details of the supplier of the safety data sheet Company : AZ Electronic Materials (Germany) GmbH Rheingaustrasse 190-196 , 65203 Wiesbaden Germany Telephone E-mail address : +49 (0)611 962 8563 : PSE@az-em. MANUFACTURER/SUPPLIER NAME: CLARIANT CORPORATION AZ ELECTRONIC MATERIALS P. We would like to show you a description here but the site won’t allow us. 1 Product identifier Product number 697330 Product name AZ 400 K Developer AZ 400K Developer AZ 1512 Photoresist AZ 726 MIF Developer AZ 1518 Photoresist 917MIF AZ 5214-E IR Photoresist AZ Aquatar-VIII-A 45 AZ Developer 1:1 AZ EBR Solvent AZ MIR 703 Resist 14cPs AZ MIR 703 Photoresist 19cPs AZ MIR 703 Photoresist 25cPs AZ nLOF 2020 Photoresist AZ nLOF 2070 Photoresist AZ nLOF 5510 Photoresist AZ NMP Rinse AZ P4110 Technical datasheet for AZ® 10XT photoresists, covering applications, processes, and performance. 70 Meister Avenue Somerville, NJ 08876, Telephone No. SECTION 16. AZ® 351B Developer is a NaOH-based developer, particularly suitable for developing non-chemically amplified positive resists with layer thicknesses of a few µm. 5 or 1:3). Dec 11, 2025 · Safety Data Sheets (SDS) are available below for all chemicals approved for use in the cleaanroom and are also available in hard copy in the yellow SDS binders located in the cleanroom. 58 MB, MIME type: application/pdf) For very thin resist layers (< 1 µm) or very high resolution requirements, it can be useful to dilute the AZ® 726 MIF Developer with water (AZ ® 726 MIF: water = 2:1 to a maximum of 1:1). AZ® 300 MIF developer is compatible with all commercially available wafer and photomask processing equipment. 2, BBG7049, 312, 184416 Revision date 2006 February 10 Language English May 13, 2002 · SDS management, distribution & revision solutions - for every budget. Precise manufacture and stringent quality control ensure batch-to-batch reproducibility and product quality. Somerville, NJ 08876 Bei uns erhalten Sie die passenden MIC (metal-ion-containing) Entwickler wie AZ 400K, AZ 351B, AZ 303 and AZ Developer für Ihren Prozess. AZ developers are defi ned by a product name and, as applicable, a dilution in parts of developer concentrate to parts of deionized water, e. It was designed to achieve utmost contrast and best wall profile. Spray or immersion developing in AZ 400K series developers is recommended. Contains surfactants to improve development uniformity, so avoid stirring. pdf), Text File (. Free access to more than 4. AZ® 726 MIF Developer Metal Ion-free Developers General Information AZ® 726 MIF is a TMAH-based developer for dip or puddle development, compatible with all AZ® photoresists from our portfolio. AZ 400K 1:3 or AZ 421K (unbuffered) are recommended for resist film thicknesses above 12μm. number: 800-424-9300 CHEMTREC Trade name: AZ 400K DEVELOPER (US) AZ 300MIF Developer AZ 300MIF is an ultra-high purity, general purpose, surfactant free 0. Don't have an account yet? Register now. With AZ® 351B or AZ® 400K, it may be advisable to work with a higher diluted developer (for example 1:5 to 1:6) instead of the usual 1:4 dilution to achieve very fine resist structures or better controllable development times. You will receive the access data after completing the form. Jun 3, 2024 · Find the Safety Data Sheet (SDS) for any approved material in the KNI Lab below (you can also browse the KNI's SDS Box Directory). The information given is designed only as a guidance for safe handling, use, processing, storage, transportation, disposal and release and is not to be considered a warranty or quality specification. AZ® 400K Developer is a buffered, KOH based developer formulation for many positive and image reversal resists. pdf File File history File usage AZ_Developer_MSDS. A t tachments (1) Page History Page Information Resolved comments View in Hierarchy View Source Export to PDF Export to Word Pages nanoFAB Knowledge Base Safety Data Sheet (SDS) Repository Jira links SECTION 16. 顯影液 AZ 300MIF DEVELOPER (AZ 6112) 8. SECTION 1: Identification of the substance/mixture and of the company/undertaking 1. Partition coefficient: n-octanol/water log Pow: -1. 5μm, a Bottom Anti-Reflective SECTION 1: Identification of the substance/mixture and of the company/undertaking 1. 顯影液 DEVELOPER 10. Chemicals Provided by the KNI with typical SDS Requesting New Chemicals Gases 1,1,1,2-Tetraflouroethane (Matheson Tri-Gas) Air Compressed (Air Liquide) Argon, compressed (Matheson Tri-Gas) Boron Trichloride (Matheson Tri-Gas) Carbon Dioxide, Gas (Matheson Tri-Gas Bei uns erhalten Sie die passenden MIF (metal-ion-free) Entwickler wie AZ 326MIF, AZ 726MIF, AZ 2026MIF für Ihren Prozess. Protect from light and heat and store in sealed original containers between 0°C and 25°C, exceeding this range to +27°C for 10 hours, +32°C for 6 hours or +35°C for 5 hours does not adversely affect the properties. txt) or read online for free. Resists of AZ’s 1500 series can be developed in a variety of metal ion free developers (with and without surfactants) using a spray/puddle process. 4. The KOH-based AZ® 400K (also 1:4 - 1:5 diluted) is also possible. AZ Developer is available as a concentrate for custom diluting with DI water or pre-diluted 1:1 for use directly from the bottle. Contact AZ Electronic Materials Product Safety for additional information (908-429-3593 or 908-429-3562). Product name Product Use Description Company : AZ 300 MIF DEVELOPER : Intermediate for electronic industry : EMD Performance Materials Corp. AZ® developers are high contrast, ultra-high purity, and formulated for a wide range of lithography applications. Get medical attention immediately for ingestion or breathing problems or if skin contact is extensive. This document provides safety information for AZ 400K developer. No ingredient of this product present at levels greater than or equal to 0. Data for AZ 917 MIF DEVELOPER Additional ecological information : No ecological testing was carried out on the preparation. File:AZ Developer MSDS. Refer to the current version of the MSDS and to local regulations for up to date information on safe handling and p oper disposal. Technical Data Sheets (TDS) can be obtained from the suppliers. They are flammable liquids and should be kept away from oxidants, sparks and open flames. Includes spin curves and process parameters. BOX 3700, 70 MEISTER AVENUE SOMERVILLE, NJ 08876-1258 TELEPHONE NUMBERS: EMERGENCY-CHEMTREC: (800) 424-9300 PRODUCT SAFETY INFORMATION: (908) 429-3593 CUSTOMER SERVICE: (800) 515-4164 PRODUCT NAME: AZ(R) 400K DEVELOPER SYNONYMS: NONE smartfabgroup free database of commercially available near UV (g-h-i line and broadband)photoresists with active links to datasheets For this purpose, we recommend the AZ® 1500 series for resist film thicknesses of 500 nm to 3 µm, the AZ® ECI 3000 series for 1-4 µm resist film thickness, or the AZ® 4500 series for films of several 10 µm thickness. Jul 23, 2012 · File:AZ 300 MIF Developer MSDS. AZ® 300 MIF, AZ® 326 MIF, AZ® 726 MIF and AZ® 2026 MIF Developers are developer formulations with 2. Mar 21, 2007 · AZ 917 MIF Developer 370-0200 Manufacturer AZ Electronic Materials Of Clariant Corp Product code 370-200, 000000500381 Revision date 2007 March 21 Language English Developers For development, we recommend either TMAH-based developers such as AZ® 326 MIF or AZ® 726 MIF, the NaOH-based AZ® 351B (typically 1:4 diluted with water), and if the selectivity requirements are not too high, the KOH-based AZ® 400K (also typically 1:4 diluted with water). pdf File File history File usage AZ_300_MIF_Developer_MSDS. BOX 3700, 70 MEISTER AVENUE SOMERVILLE, NJ 08876-1258 TELEPHONE NUMBERS: EMERGENCY-CHEMTREC: (800) 424-9300 PRODUCT SAFETY INFORMATION: (908) 429-3593 CUSTOMER SERVICE: (800) 515-4164 PRODUCT NAME: AZ(R) 400K DEVELOPER SYNONYMS: NONE DEVELOPING Spray or immersion developing in AZ 400K series developers is recommended. Oct 17, 2017 · AZ 400K Technical Datasheet (Merck) AZ 400K Developer MSDS AZ 340 AZ 340 is a buffered sodium hydroxide (NaOH) based developer for Novolak based photoresist, such as AZ1518 and AZ9260. Wear solvent resistant gloves, protective cloth-ing, and eye/f No ingredient of this product present at levels greater than or equal to 0. SDS management, distribution & revision solutions - for every budget. 1 mPas at 68 °F (20 °C) Explosive properties Oxidizing properties Ignition temperature Corrosion Not classified as explosive. Refer to the current version of the MSDS and to local regulations for up to date information on safe handling and proper disposal. It is an odourless, aqueous, inorganic, alkaline solution. 4 - 2. 8µ Product Data Sheet: AZ1505 Product Data Sheet MSDS: AZ1505, AZ1512, AZ1518 Developer: 351 Dev:H2O (1:5) Process: Recipe, Speed vs. 1 Product identifier Product number 697333 Product name AZ 726 MIF Developer MATERIAL SAFETY DATA SHEET Developer Substance key: BBG7027 Version 1 Section 07 - Handling and Storage Advice on safe handling: AZ Eloalronie Materials REVISION DATE: 12/18/2009 Print Date: 01/06/2010 Use only with adequate ventilation and proper protective eyewear, gloves, and clothing. MIF identifies the developer as 'Metal Ion Free' as SECTION 1: Identification of the substance/mixture and of the company/undertaking 1. Data for AZ 400K Developer 1:4 ing was carried out on the preparation. Material Safety Data Sheet (MSDS) Go to : A | B | C | D | E | F | G | H | I | K | L | M | N | O | P | R | S | T | U | V | W | X | Y | Z A 2-Acrylamido-2-Methyl-1-Propanesulfonic Acid A-174 Organosilane ester (PDF) Acetic Acid, Glacial Acetone Activated Charcoal Adhesion Promoter AP3000 Adhesive Black Q3-6611 Alconox Alkylsulfonic Acid All Solv THE EMERGENCY PHONE NUMBERS ARE: CHEMTREC (800) 424-9300 FOR (NON EMERGENCY) PRODUCT INFORMATION CALL: HOECHST CELANESE (800) 835-5235 PRODUCT NAME : AZ 400K DEVELOPER DILUTED 1:4 (800) 235-2637 MSDS NUMBER: 50007075 HEALTH INFORMATION (CONTINUED) MEDICAL CONDITIONS AGGRAVATED: PREEXISTING SKIN AND EYE CONDITIONS MAY BE AGGRAVATED. Apr 19, 2013 · SDS management, distribution & revision solutions - for every budget. AZ 435MIF and AZ 400K 1:3 or AZ 400K 1:4 a e recommended. These AZ Photoresists are made up with our patented safer solvent PGMEA. Hard bake temperatures should be in the 90° to 100°C range to ensure minimal thermal distortion AZ® 10XT is a thick positive resist with high resolution potential for wet etching and plating applications. Soft bake temperatures for AZ 12XT should be in the 95°-110°C range. It is a basic solution (pH≈13) of <2% sodium hydroxide and <5% of disodium tetraborate buffer. It is expected that discharges to a sizable POTW will not affect the ability to pass the WET tests. com Responsible/issuing person Description AZ 303 Developer is a special developer designed for use with AZ 111 XFS and AZ 8112 Photoresists. 0μm thick Expose: 350-450nm sensitive Develop: Spray or immersion Developer type: Inorganic (IN) * Use higher soft bake temp. For line/space patterns below 0. 1% is identified as a known or anticipated Likely route of exposure Inhalation, Eye contact, Skin Material Safety Data Sheets Search for MSDS: Clear Search Pages: 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 Show Jun 6, 2005 · SDS management, distribution & revision solutions - for every budget. Delays between soft bake and exposure should be minimized for optimum 12XT performance. Manufacturer AZ Electronic Materials Of Clariant Corp Product code 1 1. Data for 25% Tetramethylammonium hydroxide solution (75-59-2) Oct 1, 2002 · SDS management, distribution & revision solutions - for every budget. AZ MIF developers are high contrast, ultra-high purity tetramethyl-ammonium hydroxide (TMAH) based photoresist developers formulated for a wide range of advanced IC and thick photoresist applications. This effect is most pronounced on contact hole layers where CD’s are below 0. No information available. MARLBOROUGH, MASSACHUSETTS 01752 PHONE NUMBER (508) 481-7950 Material Safety Data Sheets 4-Methyl-2-Pentanone PDF 950 PMMA in Anisole PDF Acetone PDF Aluminum Etchant Type A PDF Ammonia NH3 PDF AMMONIUM HYDROXIDE PDF AR_N 7520 Ebeam Resist PDF AR-P 6200 E-Beam Resist PDF AR-PC 5090, 5091 Coating PDF AR 300-40 Developer PDF Argon Ar PDF AZ 300 MIF Developer PDF AZ 3318D PHOTORESIST (30 CPS) PDF Here you can download technical data sheets for our products. 5 million safety data sheets available online, brought to you by 3E. 70 Meister Ave. Developer bulletins with additional processing details are available. Download Safety Data Sheet PDFs Developers If metal ion containing developers can be used the KOH-based AZ® 400K in a 1:4 dilution or the finish diluted version AZ® 400K 1:4 (for higher resist film thicknesses 1:3. It is particularly recommended for thin resists such as AZ1518. for best adhesion to metals. AZ developers are defined by a product name and, as applicable, a dilution in parts of developer concentrate to parts of deionized water, e. An affiliate of Merck KGaA, Darmstadt Germany One International Plaza, Suite 300 Philadelphia, PA 19113 Material Safety Data Sheets Search for MSDS: Clear Search Pages: 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 Show A PEB is optional for AZ 10XT. If metal ion free developers have to be used, we recommend the TMAH-based AZ® 2026 MIF developer (undiluted Developers For development, we recommend either TMAH-based developers such as the ready-to-use AZ® 326 MIF or AZ® 726 MIF, the NaOH-based AZ® 351B (typically 1: 4 diluted with water), and if the selectivity requirements are not too high, the KOH-based AZ® 400K K (also typically 1:4 diluted with water). AZ1500 series Storage: Refrigerator - chase 2 Type: Positive Thickness Range: 0. DEVELOPING ic developers. Recommended use of the chemical and restrictions on use Recommended use : Materials for use in technical applications Description AZ 340 Developer is a general purpose developer for use with almost any positive AZ Photoresist. Product Features The ready-to-use AZ® 726 MIF Developer is an aqueous 2. 38 % TMAH (tetramethylammoniumhydroxide) in H2O. Most of these data sheets and specification sheets are only available in English. Those components present at the de minimus concentration have been identified in the hazardous ingredients section of the MSDS. Request access via email Contact us to get temporary access credentials for downloading MSDS documents. Store AZ® Developer is a sodium meta silicate based developer formulation for positive and image reversal resists with full compatibility to aluminum. Data for 25% Tetramethylammonium hydroxide solution (75-59-2) We would like to show you a description here but the site won’t allow us. For high throughput batch processing in a tank, inorganic developers are an excellent alternative. It is an odourless, aqueous, inorganic, alkaline solution, free of phosphates. thickness AZ 10 XT Storage: Refrigerator - chase 2 Type: Positive Thickness Range: 4. 00 % TMAH in H2O with surfactants added for fast and homogeneous substrate wetting and further additives for removal of resist residuals. In case of low resolution requirements, the PL 177 is a economically priced alternative. It lists potassium borates and potassium hydroxide as hazardous ingredients. OTHER INFORMATION The information provided in this Material Safety Data Sheet is correct to the best of our knowledge, information and belief at the date of its publication. Never give anything by mouth to an unconscious person. Do not allow to enter so l, waterways or waste w Entdecken Sie präzise Entwickler für die Fotolithografie. Process optimization is recommended to ensure optimum pattern profiles and stable lithographic and adhesion performance. AZ® Developer 1:1 is a ready-to-use product and a sodium metal silicate based developer formulation for positive and image reversal resists with full compatibility to aluminum. ated carcinogens. AZ Developer 1:1 may be used in applications requiring zero etch rate on Aluminum substrates. Data for AZ 300 MIF Developer Further information : No toxicological testing was carried out on the preparation. 70μm. This makes it suitable for dip or spray development, but less for puddle AZ developers are defined by a product name and, as applicable, a dilution in parts of developer concentrate to parts of deionized water, e. 20 L developer per L photoresist) AZ® Developer is based on sodium phosphate and –metasilicate, is optimized for minimal aluminum attack and is typically used diluted 1 : 1 in DI water for high contrast or undiluted for high development rates. Recommended for puddle, spray, and immersion applications. Do Substance key: BBG7070 Version : 1 - / USA Revision Date: 09/30/2002 Date of printing :07/15/2004 not induce vomiting. g. AZ® 326 MIF Developer Metal Ion-free Developer General Information AZ® 326 MIF is a TMAH-based developer for dip or spray development, compatible with all AZ®</sup photoresists from our portfolio. AZ® Developer and AZ 400K developer are supplied as concentrates or prediluted. , AZ® 400K developer 1:4. See label for details. High thermal stability especially in image reversal mode Developers If metal ion containing developers can be used, the NaOH-based AZ® 351B in a 1:4 dilution (for a required resolution < 1 µm 1:5 dilution recommended) is a suited developer. An affiliate of Merck KGaA, Darmstadt Germany One International Plaza, Suite 300 Philadelphia, PA 19113 OECD Test Guideline 202 (ECHA) Biodegradability 100 %; 28 d OECD Test Guideline 301B (ECHA) Readily biodegradable. Created Date11/16/2007 4:11:02 PM Thick Photoresist Product Summary Platform: DNQ = Novolak, CA = Chemically Amplified, PP = Photopolymer Wavelength: Red font indicates better performance. Information on the substance/preparation Product Safety: 908-429-3562 Emergency Tel. O. CHEMICAL PRODUCT AND COMPANY IDENTIFICATION ------ PRODUCT CODE TRADE NAME MANUFACTURER/SUPPLIER ADDRESS 30900 MICROPOSIT 351 DEVELOPER SHIPLEY COMPANY 455 FOREST ST. pdf (file size: 1. pdf (file size: 205 KB, MIME type: application/pdf) Soft bake times and temperatures may be application specific. MATERIAL SAFETY DATA SHEET Developer Substance key: BBG7027 Version 1 Section 07 - Handling and Storage Advice on safe handling: AZ Eloalronie Materials REVISION DATE: 12/18/2009 Print Date: 01/06/2010 Use only with adequate ventilation and proper protective eyewear, gloves, and clothing. Entdecken Sie Fotochemikalien für präzise und zuverlässige Ergebnisse in der Fotolithografie und Industrie. The dark erosion of this ------1. OTHER INFORMATION The information provided in this Safety Data Sheet is correct to the best of our knowledge, information and belief at the date of its publication. 顯影液 FHD 5 (FH 6400) 7. SECTION 16. Data for 25% Tetramethylammonium hydroxide solution (75-59-2) Acute oral toxicity : LD50: 136 mg/kg Species: rat Acute dermal toxicity : LD50: 25 mg/kg Species: rat Acute toxicity (other routes of administration) : LDLo: 19 mg/kg Application Route: subcutaneous Species: Mouse Skin Information on the substance/preparation Product Safety: 908-429-3562 Emergency Tel. AZ 400K 1:3 or AZ 421K (unbuffered) are recommended for resist film thicknesses above 12&micro;m. : +1 800-515-4164 Utah NanofabChemical Safety Data SheetsUtah Nanofab Our safety data sheets are password-protected. This developer concentrate is buffered for extended bath life and stable develop rates in batch processes. AZ 421K developer is unbuffered. Further information for storage conditions: Store at appropriate temperature. 4 (20 °C) OECD Test Guideline 107 Bioaccumulation is not expected. Dilute using 1 part AZ® 340 Developer to 4 parts DI water for high contrast processing. Shelf life is SECTION 16. However, discharges to a small POTW or direct discharges to surface waters should be carefully reviewed. The AZ® 726 MIF Developer contains additionally a surfactant for better wetting and easy to settle up of puddle development. CARCINOGEN: IARC: NO NTP: NO OSHA: NO OCCUPATIONAL EXPOSURE SECTION 1. AZ® 421K developer is prediluted. An affiliate of Merck KGaA, Darmstadt Germany One International Plaza, Suite 300 Philadelphia, PA 19113 AZ® 303 Developer Inorganic, Metal Ion Containing Developer General Information AZ® 303 MIC is a KOH and NaOH based developer for positive and negative resists. Developers For development, we recommend either TMAH-based developers such as the ready-to-use AZ® 326 MIF or AZ® 726 MIF, or the KOH-based AZ® 400K 1:4 (typically 1: 4 diluted with water, for faster development also slightly stronger with 1:3. It is compatible with batch and in-line spray-developing processes. ANTI-REFLECTIVE COATINGS Top Anti-Reflective Coatings (TARCs) such as AZ AquatarTM Coating will improve photospeed and with-in die CD uniformity of printed features. AZ® EBR Solvent or AZ® EBR 70/30 Developers AZ® 400K 1:3 or 1:4, AZ® 421K, AZ Developer 1:1, AZ 340 Removers AZ® 300T, AZ® 400T, AZ Kwik Strip Soft Bake: 90-115C* Rehydrate: for films > 4. number: 800-424-9300 CHEMTREC Trade name: AZ 400K DEVELOPER (US) AZ developers are defined by a product name and, as applicable, a dilution in parts of developer concentrate to parts of deionized water, e. Create a free account to get permanent access to all MSDS documents. SECTION 1. AZ 400K 1:4 provides improved developer selectivity for thinner films. Über unsere Produkte informieren und kaufen! File:AZ Developer MSDS. TSCA Exemptions WHMIS Classification MA Right To Know Law E All components have been checked for inclusion on the Massachusetts Substance List (MSL). ca. 1. Recommended materials of construction include stainless steel, PTFE, polypropylene, and high density polyethylene. Industry sector : Electronic industry Type of use : Intermediate for electronic industry High thermal stability especially in image reversal mode Developers If metal ion containing developers can be used, the NaOH-based AZ® 351B in a 1:4 dilution (for a required resolution < 1 µm 1:5 dilution recommended) is a suited developer. Jan 6, 2006 · SDS management, distribution & revision solutions - for every budget. AZ® 2033 MIF Developer is 3. . 正光阻 AZ P4620 5. Developers For development, we recommend either TMAH-based developers such as the ready-to-use AZ® 326 MIF or 726 MIF, or the KOH-based AZ® 400K (typically 1:4 diluted with water, for faster development also slightly stronger with 1:3. PRODUCT AND COMPANY IDENTIFICATION Product name Product Use Description Company : AZ 400K DEVELOPER DILUTED 1:4 : Intermediate for electronic industry : EMD Performance Materials Corp. The MATERIAL SAFETY DATA SHEET AZ Developer 1:1 (DE) Substance key: 000000040951 Version 1 REVISION DATE: 12/18/2009 Print Date: 09/07/2010 of spill or leak: spill, collect onto inert absorbent, and place in a suitable container. The access data for the data sheets are not your login data from our shop! anol acetate). MATERIAL SAFETY DATA SHEET AZ® 300 MIF Developer Substance key: BBG70N4 Version : 1 - 4 / USA Revision Date: 01/11/2005 Date of printing :05/06/2005 MATERIAL SAFETY DATA SHEET Developer Substance key: BBG7027 Version 1 Section 07 - Handling and Storage Advice on safe handling: AZ Eloalronie Materials REVISION DATE: 12/18/2009 Print Date: 01/06/2010 Use only with adequate ventilation and proper protective eyewear, gloves, and clothing. Optimale Ergebnisse in der Mikrostrukturierung durch innovative Chemikalien. AZ 400k developer_MSDS - Free download as PDF File (. 1% is identified as probable, possible or confirmed human carcinogen by IARC. AZ 40XT contains PGMEA (1-Methoxy-2-propanol acetate). 58 MB, MIME type: application/pdf) Jan 29, 2019 · Subscribe to updates for AZ 726 MIF Developer SDS by Merck KGaA at SDS Manager. Developers: Application Areas and Compatibilities Inorganic Developers (typical demand under standard conditions approx. Product Features AZ® 303 Developer is based on an aqueous KOH and NaOH solution and contains strong surfactants. It recommends personal protective equipment like safety eyewear and gloves when handling this product. 26N TMAH developer featuring class leading normality control and ppb level metals content. Unlike organic developers and most other inorganic developers, AZ Developer will not etch Aluminum substrates. Higher normality (less dilute) developers will improve photospeed but may increase CD non-uniformity and HARD BAKE tch processes. 顯影液 AZ 400K 9. 38% TMAH solution without any additives. The information Mar 27, 2008 · AZ (R)351 Developer Diluted 1:5 Manufacturer AZ Electronic Materials Of Clariant Corp Product code 351, 184430, BBG7029 Revision date 2008 March 27 Language English Feb 13, 2006 · SDS management, distribution & revision solutions - for every budget. This developer is recommended for use with most thick DNQ type photoresists and is available as a concentrate or pre-diluted with DI water in process ready 1:3 (AZ 400K 1:3) or 1:4 (AZ 400K 1:4) ratios. 正光阻 AZ5214E 6. The tetramethylammonium ion (TMA), as TMAH, in this developer is toxic at low levels to the water flea ceriodaphnia dubia (CD) used in the whole effluent toxicity (WET) biomonitoring test. Chemicals Provided by the KNI with typical SDS Requesting New Chemicals Gases 1,1,1,2-Tetraflouroethane (Matheson Tri-Gas) Air Compressed (Air Liquide) Argon, compressed (Matheson Tri-Gas) Boron Trichloride (Matheson Tri-Gas) Carbon Dioxide, Gas (Matheson Tri-Gas Trade name AZ 726 MIF Developer (DE) Material number: 100558 Use of the substance/preparation. 負光阻顯影液 WNRD AZ 15nXT Series materials are flammable liquids containing PGMEA (1-Methoxy-2-propanol acetate). AZ® 726 MIF attacks aluminum with an etching rate of approx. 5 - 1:3 diluted possible) is a suited developer. 1 Product identifier Product number 697330 Product name AZ 400 K Developer The tetramethylammonium ion (TMA), as TMAH, in this developer is toxic at low levels to the water flea ceriodaphnia dubia (CD) used in the whole effluent toxicity (WET) biomonitoring test. Product Features The ready-to-use AZ® 326 MIF developer is an aqueous 2. 70 nm/min. General Information AZ® 340 Developer is a high normality sodium based developer concentrate for use in on-site custom dilution applications. 38% TMAH solution with a surfactant for even substrate wetting for puddle development, but is also suitable for immersion AZ® MIR 701 (29CPS) is a DNQ based thin resist with high thermal stability and very high resolution potential for dry etching applications. If ingested, give water or milk to dilute stomach contents. ons7lbpr
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